Modo 203 出來了

各Modo 用戶可在這裡交流問題和分享制作經驗

版主: ed209

Modo 203 出來了

文章ed209 » 14日 3月 2007年, 01:02

Luxology Delivers modo 203

Free Update Provides UV Editing Innovations, Faster Rendering Speed and New DXF Plug-in

San Mateo, Calif. — March 13, 2007 — Luxology® LLC, an independent technology company developing next-generation 3D content creation software, today announced the immediate availability of modo 203. With enhancements to UV editing tools, faster rendering speed and a new DXF translator plug-in, modo 203 offers significant performance and workflow improvements to its worldwide base of modo customers, and provides one of the fastest paths to creating high-quality 3D content for game development, design visualization, film visual effects, video production and graphic arts. Registered modo 202 customers receive the modo 203 update free of charge, and a free 30-day full-featured evaluation version is available for immediate download from www.modo3d.com.

“This is another shot of modo goodness that makes modo that much better,” said Brad Peebler, president of Luxology. “The technology we are introducing for UV editing really elevates modo to best in class in this critically important phase of 3D workflow. We also added a DXF translator for customers in the design and architectural visualization fields and made our wicked-fast renderer even faster.”

“We recently finished evaluating modo 203 and are frankly impressed,” said Seneca Menard, 3D artist at id Software. “Not only are the new UV tools hugely welcomed, we are delighted with the even quicker rendering speed. It’s a sweet update to one of our favorite tools and kudos to Luxology for making it free to modo users.”

New and improved features in modo 203
modo 203 includes technology and user interface additions that combine to make the rapid development of high-quality UVs even easier. The UV unwrap tool has been improved so that UVs are laid out by the software with less angular and proportional distortion as compared to the geometric polygon volume. To help modo users interactively relax the UV data, the UV pinning function has been improved. The seal hole option in UV unwrap has also been overhauled for more reliability on enclosed spaces in the mesh, such as eye sockets. UV editing is also improved through the addition of a move and sew option – an enhancement to the previous sew capability that makes the joining and scaling of discontinuous UVs a one-step operation. Copying and pasting a UV between polygons is now facilitated in modo, and a new UV orient capability makes it very easy to have all UVs perfectly lined up horizontally or vertically.

The modo renderer - already one of the industry’s fastest renderers for global illumination - gets two additional speed injections in modo 203. The fundamental operation of ray tracing has been boosted as much as 1.4 times in tests conducted by Luxology and even greater speed has been reported by beta testers. In addition to faster production rendering, ambient occlusion and full light “baking” operations (often employed to further accelerate rendering in game development and many other fields) also benefit from the ray-tracing speed improvement. Irradiance caching has been optimized, further cranking up global illumination performance on large resolution renderings.

modo 203 also features a new DXF plug-in that reads and writes ASCII DXF files from inside modo. Architects and designers can now use modo to import a range of 2D and 3D entities from DXF files; including: polymesh, arcs, circles, lines, points, polylines and more. Layers in the incoming DXF files are automatically created as corresponding layers in the modo scene to preserve file organization. On export from modo, the new translator converts modo triangles and quads into a polymesh, with vertex connectivity maintained. This further extends modo’s pipeline integration capabilities, allowing it to be used in partnership with many design software tools that also support DXF.

For a complete list of modo 203 improvements, please visit www.modo3d.com.

About modo
modo is an award-winning 3D modeling, painting and rendering software designed to accelerate the creation of world-class models, associated color and normal maps, and ultra high-quality renderings. modo’s modern workflow and advanced toolset deliver increased productivity and performance for 3D artists working in a variety of disciplines. modo’s innovative and powerful artist-friendly toolset offers one of the fastest paths to creating great games content and is a recipient of the renowned Game Developer Front Line Award.

Pricing and Availability
modo ships on a single disc supporting both Mac OSX and Windows, and sells for a suggested retail price of USD $895. Current modo 202 users receive the modo 203 update as an electronic download free of charge. A free 30-day full-function evaluation version of modo 203 is also available for immediate download from modo3d.com. The modo 203 evaluation version includes a starter pack of sample files and an interactive exploration guide that provides an artful introduction to modo’s most popular tools. Luxology also offers a wide array of modo training videos and other educational materials designed to enhance the modo learning process for novice and experienced users.

To purchase, learn more about modo 203 and see a gallery of stunning user images, please visit www.modo3d.com or contact Luxology at (650) 378-8506.

About Luxology
Based in San Mateo, Calif., Luxology® LLC is an independent technology company developing next-generation 3D content creation software that enhances productivity via artist-friendly tools powered by a modern underlying architecture. Founded in 2002 by Allen Hastings, Stuart Ferguson and Brad Peebler, Luxology is home to some of the top 3D engineering expertise in the industry. More information on Luxology, its flagship product modo?, a gallery of artists’ images and the active modo community is available online at www.modo3d.com.
頭像
ed209
討論區主持
討論區主持
 
文章: 478
註冊時間: 10日 4月 2006年, 01:05
來自: OCP

Share On:

Share on Facebook Facebook Share on Twitter Twitter

文章ed209 » 14日 3月 2007年, 01:05

頭像
ed209
討論區主持
討論區主持
 
文章: 478
註冊時間: 10日 4月 2006年, 01:05
來自: OCP


回到 Luxology Modo

誰在線上

正在瀏覽這個版面的使用者:沒有註冊會員 和 4 位訪客

cron